G4MicroElecLOPhononScattering.hh

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//
// G4MicroElecLOPhononModel.hh, 
//                              2020/05/20 P. Caron, C. Inguimbert are with ONERA [b] 
//                         Q. Gibaru is with CEA [a], ONERA [b] and CNES [c]
//                         M. Raine and D. Lambert are with CEA [a]
//
// A part of this work has been funded by the French space agency(CNES[c])
// [a] CEA, DAM, DIF - 91297 ARPAJON, France
// [b] ONERA - DPHY, 2 avenue E.Belin, 31055 Toulouse, France
// [c] CNES, 18 av.E.Belin, 31401 Toulouse CEDEX, France
//
// Based on the following publications
//
//  - Q.Gibaru, C.Inguimbert, P.Caron, M.Raine, D.Lambert, J.Puech, 
//        Geant4 physics processes for microdosimetry and secondary electron emission simulation : 
//        Extension of MicroElec to very low energies and new materials
//        NIM B, 2020, in review.
//
//
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#ifndef G4MICROELECLOPHONONSCATTERING_HH 
#define G4MICROELECLOPHONONSCATTERING_HH 1 
 
#include "G4VEmProcess.hh"
#include "G4Electron.hh"
#include "G4MicroElecLOPhononModel.hh"
 
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class G4MicroElecLOPhononScattering : public G4VEmProcess
{
public:
  G4MicroElecLOPhononScattering(const G4String& processName = "LOPhononScattering",
                    G4ProcessType type = fElectromagnetic);
  ~G4MicroElecLOPhononScattering() override;
  
  G4bool IsApplicable(const G4ParticleDefinition&) override;
  void PrintInfo() override;
  
protected:
  void InitialiseProcess(const G4ParticleDefinition*) override;
  
private:
  G4bool isInitialised;
};
 
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#endif